VLSI TECHNOLOGY by Simon m Sze| Pustakkosh.com
ISBN: 9780070582910
Upgrade your VLSI expertise with “VLSI Technology” by Simon Sze, available on Pustakkosh.com. This highly acclaimed book dives into VLSI fabrication processes, covering topics like lithography, oxidation, diffusion, metallization, plasma etching, and VLSI process integration. Visit Pustakkosh for affordable prices and best deals. We challenge you to compare across ecommerce providers you wont get a better deal.
Simon Sze’s VLSI Technology is a comprehensive guide to the theoretical and practical aspects of Very Large Scale Integration (VLSI), a vital field in modern electronics. Designed for students, researchers, and professionals, this book is a must-read for anyone aiming to excel in semiconductor manufacturing, materials science, and electronics design. Its well-structured chapters and practical approach make it an invaluable resource for the Indian semiconductor and electronics industry.
Topics
The book covers all critical aspects of VLSI fabrication and process integration, with each chapter dedicated to a specific process or technique:
1. Crystal Growth and Wafer Preparation
– Explains the science behind crystal structures and the preparation of silicon wafers, essential for creating high-quality VLSI substrates.
2. Epitaxy
– Details the processes involved in epitaxial growth, evaluation methods, and their significance in device performance.
3. Film Deposition
– Comprehensive coverage of dielectric and polysilicon deposition, including techniques for silicon dioxide and silicon nitride films.
4. Oxidation
– Analyzes oxidation kinetics, techniques, and their impact on device reliability.
5. Diffusion
– Delves into diffusion models, mechanisms, and the behavior of dopants in silicon, critical for device miniaturization.
6. Ion Implantation
– Discusses ion implantation systems, disorder production, and methods for achieving shallow junctions in devices.
7. Lithography
– Covers advanced lithographic methods like optical, electron beam, and X-ray lithography, highlighting their role in miniaturization.
8. Dry Etching
– Examines plasma-assisted etching techniques, focusing on precision in pattern transfer and edge profiling.
9. Metallization
– Details methods for depositing and optimizing interconnect materials, including the use of silicides.
10. Process Simulation
– Explores simulation methods for processes like lithography, diffusion, and epitaxy, enabling process optimization.
11. VLSI Process Integration
– Provides insights into integrating NMOS, CMOS, and bipolar IC technologies, along with strategies for circuit miniaturization.
With India emerging as a key player in semiconductor manufacturing and electronics design, understanding VLSI is critical for aspiring engineers and researchers. Simon Sze’s book equips readers with the latest techniques and knowledge needed to excel in India’s growing electronics sector. Topics such as lithography and process integration are particularly relevant for tackling challenges in device fabrication and circuit design.